Invention Application
- Patent Title: POLISHING COMPOSITION
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Application No.: US15129835Application Date: 2015-03-20
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Publication No.: US20170174939A1Publication Date: 2017-06-22
- Inventor: Masashi TERAMOTO , Tatsuya NAKAUCHI , Noriaki SUGITA , Shinichi HABA , Akiko MIYAMOTO
- Applicant: NITTA HAAS INCORPORATED
- Applicant Address: JP Osaka
- Assignee: Nitta Haas Incorporated
- Current Assignee: Nitta Haas Incorporated
- Current Assignee Address: JP Osaka
- Priority: JP2014-073433 20140331
- International Application: PCT/JP2015/059921 WO 20150320
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14 ; H01L21/02

Abstract:
Proposed is a polishing composition including hydroxyethyl cellulose, water and abrasive grains, wherein the hydroxyethyl cellulose has a molecular weight of 500,000 or more and 1,500,000 or less, and the proportion of the hydroxyethyl cellulose adsorbed to the abrasive grains is 30% or more and 90% or less.
Public/Granted literature
- US10344184B2 Polishing composition Public/Granted day:2019-07-09
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