- 专利标题： SLURRY COMPOSITION, USE THEREOF, AND POLISHING METHOD
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申请号： US15176162申请日： 2016-06-08
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公开(公告)号： US20170253766A1公开(公告)日： 2017-09-07
- 发明人: Yun-Lung Ho , Chung-Wei Chiang , Song-Yuan Chang , Ming-Hui Lu , Ming-Che Ho
- 申请人： UWIZ Technology Co., Ltd.
- 优先权： TW105106055 20160301
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; B24B37/24 ; C23F3/00
摘要：
Provided is a slurry composition including abrasive particles, halogen oxide, and nitroxide compound. The combination of halogen oxide and nitroxide compound has a synergistic effect to remove a substrate containing tungsten and silicon oxide. Moreover, a use of the slurry composition and a polishing method using the slurry composition are provided.
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