公开(公告)号：US20190203073A1

公开(公告)日：2019-07-04

申请号：US16297745

申请日：2019-03-11

Applicant: UWIZ Technology Co., Ltd.

Inventor： Yun-Lung Ho ,  Chung-Wei Chiang ,  Song-Yuan Chang ,  Ming-Hui Lu ,  Ming-Che Ho

IPC: C09G1/02 ,  H01L21/321

CPC classification number: C09G1/02 ,  B24B37/24 ,  H01L21/3212

Abstract: Provided is a slurry composition including abrasive particles, halogen oxide, and nitroxide compound. The combination of halogen oxide and nitroxide compound has a synergistic effect to remove a substrate containing tungsten and silicon oxide. Moreover, a use of the slurry composition and a polishing method using the slurry composition are provided.

公开(公告)号：US20170253766A1

公开(公告)日：2017-09-07

申请号：US15176162

申请日：2016-06-08

Applicant: UWIZ Technology Co., Ltd.

Inventor： Yun-Lung Ho ,  Chung-Wei Chiang ,  Song-Yuan Chang ,  Ming-Hui Lu ,  Ming-Che Ho

IPC: C09G1/02 ,  B24B37/24 ,  C23F3/00

CPC classification number: C09G1/02 ,  B24B37/24 ,  C23F3/00 ,  C23F3/06 ,  H01L21/3212

Abstract: Provided is a slurry composition including abrasive particles, halogen oxide, and nitroxide compound. The combination of halogen oxide and nitroxide compound has a synergistic effect to remove a substrate containing tungsten and silicon oxide. Moreover, a use of the slurry composition and a polishing method using the slurry composition are provided.