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公开(公告)号：US20190203073A1
公开(公告)日：2019-07-04
申请号：US16297745
申请日：2019-03-11
Applicant: UWIZ Technology Co., Ltd.
Inventor： Yun-Lung Ho , Chung-Wei Chiang , Song-Yuan Chang , Ming-Hui Lu , Ming-Che Ho
IPC: C09G1/02 , H01L21/321
CPC classification number: C09G1/02 , B24B37/24 , H01L21/3212
Abstract: Provided is a slurry composition including abrasive particles, halogen oxide, and nitroxide compound. The combination of halogen oxide and nitroxide compound has a synergistic effect to remove a substrate containing tungsten and silicon oxide. Moreover, a use of the slurry composition and a polishing method using the slurry composition are provided.
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公开(公告)号：US20170253766A1
公开(公告)日：2017-09-07
申请号：US15176162
申请日：2016-06-08
Applicant: UWIZ Technology Co., Ltd.
Inventor： Yun-Lung Ho , Chung-Wei Chiang , Song-Yuan Chang , Ming-Hui Lu , Ming-Che Ho
CPC classification number: C09G1/02 , B24B37/24 , C23F3/00 , C23F3/06 , H01L21/3212
Abstract: Provided is a slurry composition including abrasive particles, halogen oxide, and nitroxide compound. The combination of halogen oxide and nitroxide compound has a synergistic effect to remove a substrate containing tungsten and silicon oxide. Moreover, a use of the slurry composition and a polishing method using the slurry composition are provided.
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公开(公告)号：US09165760B2
公开(公告)日：2015-10-20
申请号：US14054833
申请日：2013-10-16
Applicant: UWIZ Technology Co., Ltd.
Inventor： Yu-Chi Fu , Wen-Tsai Tsai , Ming-Hui Lu , Song-Yuan Chang
CPC classification number: H01L21/02082 , C11D7/263 , C11D7/3209 , C11D7/3245 , C11D7/5022 , C11D11/0047 , H01L21/02074
Abstract: A cleaning composition is provided. The cleaning composition includes at least one polyamino-polycarboxylic acid or at least one salt thereof, at least one solvent, at least one substituted or non-substituted phenethylamine and water. The solvent is selected from a group consisting of glycols.
Abstract translation: 提供清洁组合物。 清洁组合物包括至少一种聚氨基多羧酸或其至少一种盐，至少一种溶剂，至少一种取代或未取代的苯乙胺和水。 溶剂选自二醇类。
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公开(公告)号：US20140107008A1
公开(公告)日：2014-04-17
申请号：US14054833
申请日：2013-10-16
Applicant: UWIZ Technology Co., Ltd.
Inventor： Yu-Chi Fu , Wen-Tsai Tsai , Ming-Hui Lu , Song-Yuan Chang
IPC: H01L21/02
CPC classification number: H01L21/02082 , C11D7/263 , C11D7/3209 , C11D7/3245 , C11D7/5022 , C11D11/0047 , H01L21/02074
Abstract: A cleaning composition is provided. The cleaning composition includes at least one polyamino-polycarboxylic acid or at least one salt thereof, at least one solvent, at least one substituted or non-substituted phenethylamine and water. The solvent is selected from a group consisting of glycols.
Abstract translation: 提供清洁组合物。 清洁组合物包括至少一种聚氨基多羧酸或其至少一种盐，至少一种溶剂，至少一种取代或未取代的苯乙胺和水。 溶剂选自二醇类。
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