Invention Application
- Patent Title: GAS DISTRIBUTION APPARATUS FOR IMPROVED FILM UNIFORMITY IN AN EPITAXIAL SYSTEM
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Application No.: US15410503Application Date: 2017-01-19
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Publication No.: US20170260649A1Publication Date: 2017-09-14
- Inventor: Stephen Dale Coomer , Robert Vyne , Timo Bergman , Lee Bode , Wentao Wang
- Applicant: ASM IP Holding B.V.
- Main IPC: C30B25/14
- IPC: C30B25/14 ; C23C16/455 ; C30B25/16
Abstract:
A gas distribution system is disclosed in order to obtain better film uniformity on a wafer. The better film uniformity may be achieved by utilizing an expansion plenum and a plurality of, for example, proportioning valves to ensure an equalized pressure or flow along each gas line disposed above the wafer.
Information query
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