公开(公告)号：US20170260649A1

公开(公告)日：2017-09-14

申请号：US15410503

申请日：2017-01-19

Applicant: ASM IP Holding B.V.

Inventor： Stephen Dale Coomer ,  Robert Vyne ,  Timo Bergman ,  Lee Bode ,  Wentao Wang

IPC: C30B25/14 ,  C23C16/455 ,  C30B25/16

CPC classification number: C30B25/14 ,  C23C16/45561 ,  C23C16/45582 ,  C23C16/45587 ,  C30B25/165

Abstract: A gas distribution system is disclosed in order to obtain better film uniformity on a wafer. The better film uniformity may be achieved by utilizing an expansion plenum and a plurality of, for example, proportioning valves to ensure an equalized pressure or flow along each gas line disposed above the wafer.