公开(公告)号：US09960072B2

公开(公告)日：2018-05-01

申请号：US15050159

申请日：2016-02-22

申请人： ASM IP Holding B.V.

发明人： Stephen Dale Coomer

IPC分类号： H01L21/687 ,  H01L21/68

CPC分类号： H01L21/68742 ,  H01L21/68 ,  H01L21/68785 ,  H01L21/68792

摘要： A vertical adjustment assembly is disclosed in order to provide for matching vertical positions of two substrates within separate chambers or cavities of a reaction system for processing of semiconductor substrates. The vertical adjustment assembly, in cooperation with a main lift driver, can provide for a more accurate positioning of the substrates to account for a tolerance stack-up error.

公开(公告)号：US20180166315A1

公开(公告)日：2018-06-14

申请号：US15892756

申请日：2018-02-09

申请人： ASM IP Holding B.V.

发明人： Stephen Dale Coomer

IPC分类号： H01L21/687 ,  H01L21/68

CPC分类号： H01L21/68742 ,  H01L21/68 ,  H01L21/68785 ,  H01L21/68792

摘要： A vertical adjustment assembly is disclosed in order to provide for matching vertical positions of two substrates within separate chambers or cavities of a reaction system for processing of semiconductor substrates. The vertical adjustment assembly, in cooperation with a main lift driver, can provide for a more accurate positioning of the substrates to account for a tolerance stack-up error.

公开(公告)号：US10312129B2

公开(公告)日：2019-06-04

申请号：US15892756

申请日：2018-02-09

申请人： ASM IP Holding B.V.

发明人： Stephen Dale Coomer

IPC分类号： H01L21/687 ,  H01L21/68

摘要： A vertical adjustment assembly is disclosed in order to provide for matching vertical positions of two substrates within separate chambers or cavities of a reaction system for processing of semiconductor substrates. The vertical adjustment assembly, in cooperation with a main lift driver, can provide for a more accurate positioning of the substrates to account for a tolerance stack-up error.

公开(公告)号：US20170260649A1

公开(公告)日：2017-09-14

申请号：US15410503

申请日：2017-01-19

申请人： ASM IP Holding B.V.

发明人： Stephen Dale Coomer ,  Robert Vyne ,  Timo Bergman ,  Lee Bode ,  Wentao Wang

IPC分类号： C30B25/14 ,  C23C16/455 ,  C30B25/16

CPC分类号： C30B25/14 ,  C23C16/45561 ,  C23C16/45582 ,  C23C16/45587 ,  C30B25/165

摘要： A gas distribution system is disclosed in order to obtain better film uniformity on a wafer. The better film uniformity may be achieved by utilizing an expansion plenum and a plurality of, for example, proportioning valves to ensure an equalized pressure or flow along each gas line disposed above the wafer.

公开(公告)号：US20170092531A1

公开(公告)日：2017-03-30

申请号：US15050159

申请日：2016-02-22

申请人： ASM IP Holding B.V.

发明人： Stephen Dale Coomer

IPC分类号： H01L21/687

CPC分类号： H01L21/68742 ,  H01L21/68 ,  H01L21/68785 ,  H01L21/68792

摘要： A vertical adjustment assembly is disclosed in order to provide for matching vertical positions of two substrates within separate chambers or cavities of a reaction system for processing of semiconductor substrates. The vertical adjustment assembly, in cooperation with a main lift driver, can provide for a more accurate positioning of the substrates to account for a tolerance stack-up error.