Invention Application
- Patent Title: AlON COATED SUBSTRATE WITH OPTIONAL YTTRIA OVERLAYER
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Application No.: US15671429Application Date: 2017-08-08
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Publication No.: US20170338082A1Publication Date: 2017-11-23
- Inventor: Nilesh Gunda
- Applicant: Entegris, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C14/00 ; C23C14/08 ; C23C14/06 ; C23C14/35 ; C23C14/34
Abstract:
A fluorine plasma resistant coating on a substrate being a component in a semiconductor manufacturing system is disclosed. In one embodiment the composition includes an AlON coating that overlies a substrate, and an optional yttria coating layer that overlies the AlON coating, with a total coating thickness of about 5-6 microns.
Information query
