Invention Application
- Patent Title: ALTERNATIVE OXIDIZING AGENTS FOR COBALT CMP
-
Application No.: US15649378Application Date: 2017-07-13
-
Publication No.: US20180016469A1Publication Date: 2018-01-18
- Inventor: Steven KRAFT , Phillip W. CARTER , Andrew R. WOLFF
- Applicant: Cabot Microelectronics Corporation
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14 ; H01L21/321 ; H01L21/768
Abstract:
The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt accelerator, and (c) an oxidizing agent that oxidizes a metal, wherein the polishing composition has a pH of about 4 to about 10. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
Public/Granted literature
- US11851584B2 Alternative oxidizing agents for cobalt CMP Public/Granted day:2023-12-26
Information query
