Invention Application
- Patent Title: OPTICAL MEASURING METHOD AND APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
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Application No.: US15795592Application Date: 2017-10-27
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Publication No.: US20180340894A1Publication Date: 2018-11-29
- Inventor: Min-Ho RIM , Jung-Soo KIM , Young-Hoon SOHN , Yu-Sin YANG , Chung-Sam JUN , Yun-Jung JEE
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2017-0064008 20170524
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G02B27/09 ; H01L21/66 ; H01L21/28 ; H01L27/11582 ; H01L27/11556 ; G06T7/00 ; G01N21/95
Abstract:
An optical measuring method includes generating a Bessel beam, filtering the Bessel beam to generate a focused Bessel beam, vertically irradiating the focused Bessel beam onto a substrate in which an opening is formed, and detecting light reflected from the substrate to obtain an image of a bottom surface of the opening.
Public/Granted literature
- US10527556B2 Optical measuring method and apparatus, and method of manufacturing semiconductor device using the same Public/Granted day:2020-01-07
Information query
