HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION

Invention Application

US20190294047A1 HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION 审中-公开

Patent Title: HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION
Application No.: US16426046

Application Date: 2019-05-30
Publication No.: US20190294047A1

Publication Date: 2019-09-26
Inventor: Hyeonjin SHIN , Sangwon KIM , Minsu SEOL , Seongjun PARK , Yeonchoo CHO
Applicant: Samsung Electronics Co., Ltd.
Applicant Address: KR Suwon-si
Assignee: Samsung Electronics Co., Ltd.
Current Assignee: Samsung Electronics Co., Ltd.
Current Assignee Address: KR Suwon-si
Priority: KR10-2015-0047492 20150403
Main IPC: G03F7/11
IPC: G03F7/11 ; G03F7/36 ; G03F7/09 ; G03F7/16

Abstract:

A hardmask composition may include graphene nanoparticles having a size in a range of about 5 nm to about 100 nm and a solvent.

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/004	.感光材料（G03F7/12，G03F7/14优先）
G03F7/09	..以细部结构为特征的，例如，基片层、辅助层（印刷版的基片层一般入B41N）
G03F7/11	...具有覆盖层或中间层的，例如，（使感光乳剂固着于片基的）胶层