Invention Application
- Patent Title: TECHNIQUES FOR DETECTING MICRO-ARCING OCCURRING INSIDE A SEMICONDUCTOR PROCESSING CHAMBER
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Application No.: US16705437Application Date: 2019-12-06
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Publication No.: US20200111652A1Publication Date: 2020-04-09
- Inventor: Feng-Kuang Wu , Chih-Kuo Chang , Hsu-Shui Liu , Jiun-Rong Pai , Shou-Wen Kuo , Sing-Tsung Li
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
Some embodiments relate to a system. The system includes a radio frequency (RF) generator configured to output a RF signal. A transmission line is coupled to the RF generator. A plasma chamber is coupled to RF generator via the transmission line, wherein the plasma chamber is configured to generate a plasma based on the RF signal. A micro-arc detecting element is configured to determine whether a micro-arc has occurred in the plasma chamber based on the RF signal.
Public/Granted literature
- US10734206B2 Techniques for detecting micro-arcing occurring inside a semiconductor processing chamber Public/Granted day:2020-08-04
Information query