公开(公告)号：US10734206B2

公开(公告)日：2020-08-04

申请号：US16705437

申请日：2019-12-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Feng-Kuang Wu ,  Chih-Kuo Chang ,  Hsu-Shui Liu ,  Jiun-Rong Pai ,  Shou-Wen Kuo ,  Sing-Tsung Li

IPC: H01J37/32

Abstract: Some embodiments relate to a system. The system includes a radio frequency (RF) generator configured to output a RF signal. A transmission line is coupled to the RF generator. A plasma chamber is coupled to RF generator via the transmission line, wherein the plasma chamber is configured to generate a plasma based on the RF signal. A micro-arc detecting element is configured to determine whether a micro-arc has occurred in the plasma chamber based on the RF signal.

公开(公告)号：US10170287B1

公开(公告)日：2019-01-01

申请号：US15855128

申请日：2017-12-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Feng-Kuang Wu ,  Chih-Kuo Chang ,  Hsu-Shui Liu ,  Jiun-Rong Pai ,  Shou-Wen Kuo ,  Sing-Tsung Li

IPC: H01J37/32

Abstract: Some embodiments relate to a system. The system includes a radio frequency (RF) generator configured to output a RF signal. A transmission line is coupled to the RF generator. A plasma chamber is coupled to RF generator via the transmission line, wherein the plasma chamber is configured to generate a plasma based on the RF signal. A micro-arc detecting element is configured to determine whether a micro-arc has occurred in the plasma chamber based on the RF signal.

公开(公告)号：US20200111652A1

公开(公告)日：2020-04-09

申请号：US16705437

申请日：2019-12-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Feng-Kuang Wu ,  Chih-Kuo Chang ,  Hsu-Shui Liu ,  Jiun-Rong Pai ,  Shou-Wen Kuo ,  Sing-Tsung Li

IPC: H01J37/32

Abstract: Some embodiments relate to a system. The system includes a radio frequency (RF) generator configured to output a RF signal. A transmission line is coupled to the RF generator. A plasma chamber is coupled to RF generator via the transmission line, wherein the plasma chamber is configured to generate a plasma based on the RF signal. A micro-arc detecting element is configured to determine whether a micro-arc has occurred in the plasma chamber based on the RF signal.

公开(公告)号：US20160284584A1

公开(公告)日：2016-09-29

申请号：US15175820

申请日：2016-06-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsieh Chih-Chang ,  Chung-chieh Hsu ,  Chian-kun Chan ,  Chih-Kuo Chang ,  Chih-Ping Cheng-Jen ,  Hsu-Shui Liu ,  Lo Kai ,  Wei-ting Hsiao ,  Yung-Kai Lin

IPC: H01L21/687 ,  C23C16/458 ,  H01L21/02 ,  C23C16/18

CPC classification number: H01L21/68707 ,  C23C16/18 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/02271 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68764

Abstract: An apparatus and method for processing semiconductor substrates provides a substrate stage being a rotatable disc with a solid surface and a terraced edge with upper, intermediate and lower portions of increasing diameter. A hollow edge ring rests on the intermediate edge portion and a substrate disposed on the rotatable disc is lifted and transported by robot blades positioned beneath the edge ring and which lift the edge ring which holds the substrate around its edges. The rotatable disc and edge ring find application in MOCVD and other semiconductor manufacturing tools.

Abstract translation: 用于处理半导体衬底的设备和方法提供了具有固体表面的可旋转盘和具有增加直径的上部，中间和下部的梯形边缘的衬底台。 中空边缘环位于中间边缘部分上，并且设置在可旋转盘上的基板由位于边缘环下方的机器人刀片提升并传送，并且将围绕其边缘保持基板的边缘环提升。 可旋转盘和边缘环可应用于MOCVD和其他半导体制造工具。

公开(公告)号：US11664206B2

公开(公告)日：2023-05-30

申请号：US15901970

申请日：2018-02-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wun-Kai Tsai ,  Wen-Che Liang ,  Chao-Keng Li ,  Zheng-Jie Xu ,  Chih-Kuo Chang ,  Sing-Tsung Li ,  Feng-Kuang Wu ,  Hsu-Shui Liu

IPC: H01J37/32 ,  H01J37/244 ,  H01L21/66 ,  H01L21/67 ,  G05B19/4065 ,  C23C16/505

CPC classification number: H01J37/32926 ,  C23C16/505 ,  G05B19/4065 ,  H01J37/244 ,  H01J37/32183 ,  H01L21/67069 ,  H01L21/67253 ,  H01L22/20 ,  G05B2219/45031 ,  H01J2237/334 ,  H01J2237/3321

Abstract: A fabrication system for fabricating an IC is provided which includes a processing tool, a computation device and a FDC system. The processing tool includes an electrode and an RF sensor to execute a semiconductor manufacturing process to fabricate the IC. The RF sensor wirelessly detects the intensity of the RF signal. The computation device extracts statistical characteristics based on the detection of the intensity of the RF signal. The FDC system determines whether or not the intensity of the RF signal meets a threshold value or a threshold range according to the extracted statistical characteristics. When the detected intensity of the RF signal exceeds the threshold value or the threshold range, the FDC system notifies the processing tool to adjust the RF signal or stop tool to check parts damage.

公开(公告)号：US20190131116A1

公开(公告)日：2019-05-02

申请号：US16232404

申请日：2018-12-26

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Feng-Kuang Wu ,  Chih-Kuo Chang ,  Hsu-Shui Liu ,  Jiun-Rong Pai ,  Shou-Wen Kuo ,  Sing-Tsung Li

IPC: H01J37/32

Abstract: Some embodiments relate to a system. The system includes a radio frequency (RF) generator configured to output a RF signal. A transmission line is coupled to the RF generator. A plasma chamber is coupled to RF generator via the transmission line, wherein the plasma chamber is configured to generate a plasma based on the RF signal. A micro-arc detecting element is configured to determine whether a micro-arc has occurred in the plasma chamber based on the RF signal.

公开(公告)号：US20140273505A1

公开(公告)日：2014-09-18

申请号：US13859114

申请日：2013-04-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chang HSIEH ,  Yung-Kai Lin ,  Hsu-Shui Liu ,  Kai Lo ,  Chih-Ping Chen ,  Chian-Kun Chan ,  Chung-Chieh Hsu ,  Chih-Kuo Chang ,  Wei-Ting Hsiao

IPC: H01L21/687 ,  C23C16/458

CPC classification number: H01L21/68707 ,  C23C16/18 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/02271 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68764

Abstract: An apparatus and method for processing semiconductor substrates provides a substrate stage being a rotatable disc with a solid surface and a terraced edge with upper, intermediate and lower portions of increasing diameter. A hollow edge ring rests on the intermediate edge portion and a substrate disposed on the rotatable disc is lifted and transported by robot blades positioned beneath the edge ring and which lift the edge ring which holds the substrate around its edges. The rotatable disc and edge ring find application in MOCVD and other semiconductor manufacturing tools.

Abstract translation: 用于处理半导体衬底的设备和方法提供了具有固体表面的可旋转盘和具有增加直径的上部，中间和下部的梯形边缘的衬底台。 中空边缘环位于中间边缘部分上，并且设置在可旋转盘上的基板由位于边缘环下方的机器人刀片提升并传送，并且将围绕其边缘保持基板的边缘环提升。 可旋转盘和边缘环可应用于MOCVD和其他半导体制造工具。

公开(公告)号：US10559453B2

公开(公告)日：2020-02-11

申请号：US16232404

申请日：2018-12-26

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Feng-Kuang Wu ,  Chih-Kuo Chang ,  Hsu-Shui Liu ,  Jiun-Rong Pai ,  Shou-Wen Kuo ,  Sing-Tsung Li

IPC: H01J37/32

Abstract: Some embodiments relate to a system. The system includes a radio frequency (RF) generator configured to output a RF signal. A transmission line is coupled to the RF generator. A plasma chamber is coupled to RF generator via the transmission line, wherein the plasma chamber is configured to generate a plasma based on the RF signal. A micro-arc detecting element is configured to determine whether a micro-arc has occurred in the plasma chamber based on the RF signal.

公开(公告)号：US09741600B2

公开(公告)日：2017-08-22

申请号：US15175820

申请日：2016-06-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chang Hsieh ,  Chung-chieh Hsu ,  Chian-kun Chan ,  Chih-Kuo Chang ,  Chih-Ping Chen ,  Hsu-Shui Liu ,  Kai Lo ,  Wei-ting Hsiao ,  Yung-Kai Lin

IPC: H01L21/687 ,  H01L21/02 ,  C23C16/458 ,  C23C16/18

CPC classification number: H01L21/68707 ,  C23C16/18 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/02271 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68764

Abstract: An apparatus and method for processing semiconductor substrates provides a substrate stage being a rotatable disc with a solid surface and a terraced edge with upper, intermediate and lower portions of increasing diameter. A hollow edge ring rests on the intermediate edge portion and a substrate disposed on the rotatable disc is lifted and transported by robot blades positioned beneath the edge ring and which lift the edge ring which holds the substrate around its edges. The rotatable disc and edge ring find application in MOCVD and other semiconductor manufacturing tools.

公开(公告)号：US09425077B2

公开(公告)日：2016-08-23

申请号：US13859114

申请日：2013-04-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chang Hsieh ,  Yung-Kai Lin ,  Hsu-Shui Liu ,  Kai Lo ,  Chih-Ping Chen ,  Chian-Kun Chan ,  Chung-Chieh Hsu ,  Chih-Kuo Chang ,  Wei-Ting Hsiao

IPC: H01L21/687 ,  C23C16/458

CPC classification number: H01L21/68707 ,  C23C16/18 ,  C23C16/4584 ,  C23C16/4585 ,  H01L21/02271 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68764

Abstract: An apparatus and method for processing semiconductor substrates provides a substrate stage being a rotatable disc with a solid surface and a terraced edge with upper, intermediate and lower portions of increasing diameter. A hollow edge ring rests on the intermediate edge portion and a substrate disposed on the rotatable disc is lifted and transported by robot blades positioned beneath the edge ring and which lift the edge ring which holds the substrate around its edges. The rotatable disc and edge ring find application in MOCVD and other semiconductor manufacturing tools.

Abstract translation: 用于处理半导体衬底的设备和方法提供了具有固体表面的可旋转盘和具有增加直径的上部，中间和下部的梯形边缘的衬底台。 中空边缘环位于中间边缘部分上，并且设置在可旋转盘上的基板由位于边缘环下方的机器人刀片提升并传送，并且将围绕其边缘保持基板的边缘环提升。 可旋转盘和边缘环可应用于MOCVD和其他半导体制造工具。