- 专利标题： ETCHING COMPOSITION, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME
-
申请号： US16579073申请日： 2019-09-23
-
公开(公告)号： US20200148951A1公开(公告)日： 2020-05-14
- 发明人: Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE , Zheng HONG
- 申请人： SAMSUNG DISPLAY CO., LTD.
- 优先权： com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@14153176
- 主分类号： C09K13/06
- IPC分类号： C09K13/06
摘要：
An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.
公开/授权文献
信息查询
