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公开(公告)号:US20240306456A1
公开(公告)日:2024-09-12
申请号:US18663051
申请日:2024-05-13
发明人: Dongyoub LEE , Heejin KIM , Kitae KIM , Juhyun SHIN
IPC分类号: H10K59/131 , H10K59/40
CPC分类号: H10K59/131 , H10K59/40
摘要: A display device includes: a display area having a plurality of sub-pixels; a plurality of pad electrodes in a peripheral area outside the display area; a first organic insulating layer comprising an opening overlapping the plurality of pad electrodes; and an integrated circuit overlapping the plurality of pad electrodes and electrically connected to the plurality of pad electrodes, wherein a distance between an edge of the first organic insulating layer defining the opening and an edge of the integrated circuit is 40 micrometers (μm) or more.
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公开(公告)号:US20220190092A1
公开(公告)日:2022-06-16
申请号:US17444401
申请日:2021-08-04
发明人: Dongyoub LEE , Heejin KIM , Kitae KIM , Juhyun SHIN
IPC分类号: H01L27/32
摘要: A display device includes: a display area having a plurality of sub-pixels; a plurality of pad electrodes in a peripheral area outside the display area; a first organic insulating layer comprising an opening overlapping the plurality of pad electrodes; and an integrated circuit overlapping the plurality of pad electrodes and electrically connected to the plurality of pad electrodes, wherein a distance between an edge of the first organic insulating layer defining the opening and an edge of the integrated circuit is 40 micrometers (μm) or more.
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公开(公告)号:US20190153318A1
公开(公告)日:2019-05-23
申请号:US16157054
申请日:2018-10-10
发明人: Jonghee PARK , Kitae KIM , Jinseock KIM , Beomsoo KIM , Sangtae KIM , Kyungbo SHIM , Giyong NAM , Youngjin YOON , Daesung LIM
CPC分类号: C09K13/06 , H01L27/1259 , H01L27/3258 , H01L27/3276 , H01L51/0017 , H01L51/0023 , H01L51/5215 , H01L51/5218 , H01L51/5234 , H01L51/5253 , H01L51/56
摘要: An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.
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4.
公开(公告)号:US20200148951A1
公开(公告)日:2020-05-14
申请号:US16579073
申请日:2019-09-23
发明人: Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE , Zheng HONG
IPC分类号: C09K13/06
摘要: An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.
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公开(公告)号:US20200148950A1
公开(公告)日:2020-05-14
申请号:US16575593
申请日:2019-09-19
发明人: Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE
IPC分类号: C09K13/06
摘要: An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.
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