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公开(公告)号：US20190322935A1
公开(公告)日：2019-10-24
申请号：US16391222
申请日：2019-04-22
发明人： Jong Hee PARK , Ki Tae KIM , Jin Seock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE
摘要： An etchant composition is presented. The composition includes: 18 wt % to 25 wt % of a first organic acid compound; 15 wt % to 20 wt % of a second organic acid compound; 8.1 wt % to 9.9 wt % of an inorganic acid compound; 1 wt % to 4.9 wt % of a sulfonic acid compound; 10 wt % to 20 wt % of a hydrogen sulfate salt compound; 1 wt % to 5 wt % of a nitrogen-containing dicarbonyl compound; 1 wt % to 5 wt % of an amino acid derivative compound; 0.1 wt % to 2 wt % of an iron-containing oxidizing agent compound; and a balance amount of water.
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2.发明申请LIGHT SOURCE ASSEMBLY, DISPLAY APPARATUS HAVING THE SAME, AND METHOD OF MANUFACTURING THE SAME 有权光源组件，具有该光源组件的显示装置及其制造方法公开(公告)号：US20150003107A1
公开(公告)日：2015-01-01
申请号：US14066249
申请日：2013-10-29
发明人： Seok-Won KANG , Sang-Chul BYUN , Dong-Yeon KANG , Seok-Hyun NAM , Sang-Hyuk LEE , Hyoung-Joo KIM , Ji-Eun NAM , Ju-Young YOON
CPC分类号： G02B6/0011 , G02B6/003 , G02B6/0031 , G02B6/0068 , G02B6/0073 , G02F1/133615 , H01L33/486 , H01L33/50 , H01L33/60
摘要： A light source assembly includes a base substrate, a resin layer disposed on the base substrate, and exposing a portion of the base substrate, and a first light source disposed on the portion of the base substrate which is exposed by the resin layer. The first light source has a hexahedron shape. The first light source has a face in parallel with the base substrate and having a height smaller than length or width of the face.
摘要翻译： 光源组件包括基底基板，设置在基底基板上的树脂层，以及露出基底基板的一部分;以及第一光源，其设置在基板的由树脂层露出的部分上。 第一光源具有六面体形状。 第一光源具有与基底基板平行的面，其高度小于面的长度或宽度。
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3.发明申请公开(公告)号：US20200148951A1
公开(公告)日：2020-05-14
申请号：US16579073
申请日：2019-09-23
发明人： Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE , Zheng HONG
IPC分类号： C09K13/06
摘要： An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.
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公开(公告)号：US20200148950A1
公开(公告)日：2020-05-14
申请号：US16575593
申请日：2019-09-19
发明人： Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE
IPC分类号： C09K13/06
摘要： An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.
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