Invention Application
- Patent Title: DIELECTRIC, CAPACITOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME, AND METHOD OF PREPARING THE DIELECTRIC
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Application No.: US16409096Application Date: 2019-05-10
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Publication No.: US20200165142A1Publication Date: 2020-05-28
- Inventor: Doh Won JUNG , Chan KWAK , Euncheol DO , Hyeon Cheol PARK , Daejin YANG , Taewon JEONG , Giyoung JO
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@78c40190
- Main IPC: C01G35/00
- IPC: C01G35/00 ; H01G4/10 ; H01L49/02

Abstract:
Provided are a dielectric, a capacitor and a semiconductor device that include the dielectric, and a method of preparing the dielectric, the dielectric including: a composition represented by Formula 1; and an oxide including a perovskite type crystal structure having a polar space group or a non-polar space group other than a Pbnm space group: AxByO3-δ wherein, in Formula 1, A is a monovalent, divalent, or trivalent cation, B is a trivalent, tetravalent, or pentavalent cation, and 0.5≤x≤1.5, 0.5≤y≤1.5, and 0≤δ≤0.5.
Public/Granted literature
- US10947126B2 Dielectric, capacitor and semiconductor device including the same, and method of preparing the dielectric Public/Granted day:2021-03-16
Information query
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