Invention Application
- Patent Title: SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
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Application No.: US16776893Application Date: 2020-01-30
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Publication No.: US20200168487A1Publication Date: 2020-05-28
- Inventor: Takaya Kikai , Yuichi Yoshida , Yuzo Ohishi
- Applicant: Tokyo Electron Limited
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1493acca
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B05C11/10 ; H01L21/02 ; H01L21/677 ; B05C11/08 ; H01L21/687 ; H01L21/027 ; H01L21/311
Abstract:
Disclosed is a substrate processing apparatus including: a processing chamber that accommodates a substrate; a light source that radiates energy rays for a processing to the substrate in the processing chamber; a rotation driving unit that rotates at least one of the substrate and the light source around an axis intersecting with the substrate in the processing chamber; an opening/closing mechanism that switches between an open state and a closed state; and a controller configured to control the opening/closing mechanism to switch between the open state and the closed state, to increase a light emission amount of the light source in synchronization with the switch of the open state to the closed state by the opening/closing mechanism, and to decrease the light emission amount of the light source in synchronization with the switch of the closed state to the open state by the opening/closing mechanism.
Information query
IPC分类:
