Invention Application
- Patent Title: VALVE DEVICE, FLUID CONTROL DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS USING THE VALVE DEVICE
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Application No.: US16764134Application Date: 2018-11-13
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Publication No.: US20200278049A1Publication Date: 2020-09-03
- Inventor: Kazunari WATANABE , Kohei SHIGYOU , Kenji AIKAWA , Tomohiro NAKATA , Takahiro MATSUDA , Tsutomu SHINOHARA
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@324f53f5
- International Application: PCT/JP2018/041944 WO 20181113
- Main IPC: F16K39/02
- IPC: F16K39/02 ; F16K7/16 ; F16K27/02 ; F16K11/22

Abstract:
A valve device can be compact, low cost and has a bleed function. A valve body defines an accommodation recess which opens at a surface of the valve body and contains a valve element therein, a primary flow path and a secondary flow path connected to the accommodation recess, the valve element having a sealing portion for blocking direct communication between the primary flow path and the secondary flow path through the accommodation recess, a detour passage for making the primary flow path and the secondary flow path communicate through the valve element, and a bleed hole for making the detour passage and the secondary flow path communicate through the accommodation recess.
Public/Granted literature
- US11365830B2 Valve device, fluid control device and semiconductor manufacturing apparatus using the valve device Public/Granted day:2022-06-21
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