- 专利标题: LIQUID DISCHARGE APPARATUS AND LIQUID DISCHARGE METHOD
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申请号: US16989165申请日: 2020-08-10
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公开(公告)号: US20200369046A1公开(公告)日: 2020-11-26
- 发明人: Aya YAMASAWA , Manabu Arita , Toshihito KAMEI , Shinichi Hatanaka
- 申请人: Aya YAMASAWA , Manabu Arita , Toshihito KAMEI , Shinichi Hatanaka
- 优先权: JP2018-068467 20180330
- 主分类号: B41J11/00
- IPC分类号: B41J11/00 ; B29C64/112 ; B29C64/393 ; B41J2/01 ; G01B11/30
摘要:
A liquid discharge apparatus includes a liquid discharge device, circuitry, and a curing device. The liquid discharge device is configured to discharge a liquid having a curing degree variable by a stimulation amount while relatively moving to a recording medium. The circuitry is configured to acquire surface roughness information indicating glossiness of a formed object formed on the recording medium and set a stimulation amount for the liquid based on the surface roughness information. The curing device is configured to stimulate the liquid discharged by the liquid discharge device based on the stimulation amount set by the circuitry to cure the liquid. The circuitry is configured to set, based on the surface roughness information, the stimulation amount for each region stimulated by the curing device in a same plane of the formed object.
公开/授权文献
- US11179950B2 Liquid discharge apparatus and liquid discharge method 公开/授权日:2021-11-23
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