Invention Application
- Patent Title: PROCESS WINDOW BASED ON DEFECT PROBABILITY
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Application No.: US16955483Application Date: 2018-12-17
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Publication No.: US20210018850A1Publication Date: 2021-01-21
- Inventor: Abraham SLACHTER , Stefan HUNSCHE , Wim Tjibbo TEL , Anton Bernhard VAN OOSTEN , Koenraad VAN INGEN SCHENAU , Gijsbert RISPENS , Brennan PETERSON
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2018/085159 WO 20181217
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.
Public/Granted literature
- US11079687B2 Process window based on defect probability Public/Granted day:2021-08-03
Information query
IPC分类: