Invention Application
- Patent Title: DEEP ULTRAVIOLET LED AND METHOD FOR PRODUCING THE SAME
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Application No.: US16964881Application Date: 2019-01-25
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Publication No.: US20210036186A1Publication Date: 2021-02-04
- Inventor: Yukio KASHIMA , Eriko MATSUURA , Mitsunori KOKUBO , Takaharu TASHIRO , Hideki HIRAYAMA , Noritoshi MAEDA , Masafumi JO , Ryuichiro KAMIMURA , Yamato OSADA , Kanji FURUTA , Takeshi IWAI , Yohei AOYAMA , Yasushi IWAISAKO , Tsugumi NAGANO , Yasuhiro WATANABE
- Applicant: MARUBUN CORPORATION , SHIBAURA MACHINE CO., LTD. , RIKEN , ULVAC, INC. , TOKYO OHKA KOGYO CO., LTD. , NIPPON TUNGSTEN CO., LTD. , DAI NIPPON PRINTING CO., LTD. , DOWA HOLDINGS CO., LTD.
- Applicant Address: JP Tokyo; JP Tokyo; JP Wako-shi, Saitama; JP Chigasaki-shi, Kanagawa; JP Kawasaki-shi, Kanagawa; JP Fukuoka-shi, Fukuoka; JP Tokyo; JP Tokyo
- Assignee: MARUBUN CORPORATION,SHIBAURA MACHINE CO., LTD.,RIKEN,ULVAC, INC.,TOKYO OHKA KOGYO CO., LTD.,NIPPON TUNGSTEN CO., LTD.,DAI NIPPON PRINTING CO., LTD.,DOWA HOLDINGS CO., LTD.
- Current Assignee: MARUBUN CORPORATION,SHIBAURA MACHINE CO., LTD.,RIKEN,ULVAC, INC.,TOKYO OHKA KOGYO CO., LTD.,NIPPON TUNGSTEN CO., LTD.,DAI NIPPON PRINTING CO., LTD.,DOWA HOLDINGS CO., LTD.
- Current Assignee Address: JP Tokyo; JP Tokyo; JP Wako-shi, Saitama; JP Chigasaki-shi, Kanagawa; JP Kawasaki-shi, Kanagawa; JP Fukuoka-shi, Fukuoka; JP Tokyo; JP Tokyo
- Priority: JP2018-012073 20180126
- International Application: PCT/JP2019/002392 WO 20190125
- Main IPC: H01L33/10
- IPC: H01L33/10 ; H01L33/00 ; H01L33/06 ; H01L33/32 ; H01L33/40

Abstract:
A deep ultraviolet LED with a design wavelength λ, including a reflecting electrode layer (Au), a metal layer (Ni), a p-GaN contact layer, a p-block layer made of a p-AlGaN layer, an i-guide layer made of an AlN layer, a multi-quantum well layer, an n-AlGaN contact layer, a u-AlGaN layer, an AlN template, and a sapphire substrate that are arranged in this order from a side opposite to the sapphire substrate, in which the thickness of the p-block layer is 52 to 56 nm, a two-dimensional reflecting photonic crystal periodic structure having a plurality of voids is provided in a region from the interface between the metal layer and the p-GaN contact layer to a position not beyond the interface between the p-GaN contact layer and the p-block layer in the thickness direction of the p-GaN contact layer, the distance from an end face of each of the voids in the direction of the sapphire substrate to the interface between the multi-quantum well layer and the i-guide layer satisfies λ/2n1Deff (where λ is the design wavelength and n1Deff is the effective average refractive index of each film of the stacked structure from the end face of each void to the i-guide layer) in the perpendicular direction, the distance being in the range of 53 to 57 nm, the two-dimensional reflecting photonic crystal periodic structure has a photonic band gap that opens for TE polarized components, and provided that the period a of the two-dimensional reflecting photonic crystal periodic structure satisfies a Bragg condition with respect to light with the design wavelength λ, the order m of a formula of the Bragg condition: mλ/n2Deff=2a (where m is the order, λ is the design wavelength, n2Deff is the effective refractive index of two-dimensional photonic crystals, and a is the period of the two-dimensional photonic crystals) satisfies 2≤m≤4, and the radius of each void is R, R/a satisfies 0.30≤R/a≤0.40.
Public/Granted literature
- US11309454B2 Deep ultraviolet LED and method for producing the same Public/Granted day:2022-04-19
Information query
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