- 专利标题： Deposition Of Metal-Organic Oxide Films
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申请号： US17000457申请日： 2020-08-24
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公开(公告)号： US20210066592A1公开(公告)日： 2021-03-04
- 发明人: Feng Q. Liu , Nasrin Kazem , Jeffrey W. Anthis , Ghazal Saheli , David Thompson
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L45/00
- IPC分类号： H01L45/00 ; H01L27/24
摘要：
Methods of depositing a metal-organic oxide film by exposing a substrate surface to a metal-organic precursor and an oxidant are described. The metal-organic oxide film has the general formula MOxCy, wherein M comprises one or more of a transition metal, a lanthanide, or a boron group element, x is a whole number in a range of 1 to 6, and y is a number in a range of greater than 0 to 0.5.
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