Invention Application
- Patent Title: SOLID-STATE IMAGE PICKUP DEVICE, MANUFACTURING METHOD, AND ELECTRONIC APPARATUS
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Application No.: US17108910Application Date: 2020-12-01
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Publication No.: US20210082993A1Publication Date: 2021-03-18
- Inventor: Keisuke HATANO , Hideaki TOGASHI
- Applicant: SONY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2014-143275 20140711
- Main IPC: H01L27/148
- IPC: H01L27/148 ; H01L27/146 ; H04N5/374 ; H04N5/378

Abstract:
The present disclosure relates to a solid-state image pickup device, a manufacturing method, and an electronic apparatus, which can obtain high charge transfer efficiency from a photoelectric conversion unit to a floating diffusion layer. The floating diffusion layer is arranged in a rectangular shape so as to surround a gate electrode of a vertical transistor whose groove portion is rectangular. A reset drain is formed so as to be adjacent to the floating diffusion layer through a reset gate. A potential of the floating diffusion layer is reset to the same potential as that of the reset drain by applying a predetermined voltage to the reset gate. It is possible to apply the present disclosure to, for example, a CMOS solid-state image pickup device used in an image pickup device such as a camera.
Public/Granted literature
- US11462582B2 Solid-state image pickup device, manufacturing method, and electronic apparatus Public/Granted day:2022-10-04
Information query
IPC分类: