- 专利标题： POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD
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申请号： US17107016申请日： 2020-11-30
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公开(公告)号： US20210087325A1公开(公告)日： 2021-03-25
- 发明人: Azusa OSHITA , Minori TAKEGOSHI , Mitsuru KATO , Chihiro OKAMOTO , Shinya KATO
- 申请人： KURARAY CO., LTD.
- 申请人地址： JP Kurashiki-shi
- 专利权人： KURARAY CO., LTD.
- 当前专利权人： KURARAY CO., LTD.
- 当前专利权人地址： JP Kurashiki-shi
- 优先权： JP2017-095378 20170512
- 主分类号： C08G18/38
- IPC分类号： C08G18/38 ; B24B37/24 ; C08G18/32 ; C08G18/76 ; H01L21/3105 ; H01L21/321 ; C08G18/08 ; B24D3/00 ; B24D3/34
摘要：
A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.
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