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公开(公告)号：US20210087325A1
公开(公告)日：2021-03-25
申请号：US17107016
申请日：2020-11-30
申请人： KURARAY CO., LTD.
发明人： Azusa OSHITA , Minori TAKEGOSHI , Mitsuru KATO , Chihiro OKAMOTO , Shinya KATO
IPC分类号： C08G18/38 , B24B37/24 , C08G18/32 , C08G18/76 , H01L21/3105 , H01L21/321 , C08G18/08 , B24D3/00 , B24D3/34
摘要： A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.
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公开(公告)号：US20210380845A1
公开(公告)日：2021-12-09
申请号：US17285499
申请日：2019-11-01
申请人： KURARAY CO., LTD.
发明人： Azusa SUNAYAMA , Mitsuru KATO , Minori TAKEGOSHI , Chihiro OKAMOTO , Shinya KATO
IPC分类号： C09G1/16 , H01L21/304 , C09G1/02
摘要： Disclosed is a polyurethane for use in a polishing layer, including a carboxylic acid ester group, and a polyurethane preferably having a carboxylic acid ester group in at least one of a side chain, a main chain terminal, and a main chain skeleton is preferably used. Also disclosed is a method for modifying a polishing layer, including the steps of: preparing a polishing layer including a polyurethane having a carboxylic acid ester group; and hydrolyzing the carboxylic acid ester group of the polyurethane, to produce a carboxyl group.
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公开(公告)号：US20210309794A1
公开(公告)日：2021-10-07
申请号：US17262060
申请日：2019-07-19
申请人： KURARAY CO., LTD.
摘要： There is used a polyurethane for polishing layers that can be used as a material of a polishing layer of a polishing pad, the polyurethane including a thermoplastic polyurethane that is a reaction product of a polyurethane raw material including a polymer diol, an organic diisocyanate, and a chain extender, wherein the chain extender contains 50 mass % or more of a first chain extender including a straight-chain carbon backbone having 7 to 12 carbon atoms.
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4.发明公开公开(公告)号：US20240342858A1
公开(公告)日：2024-10-17
申请号：US18753038
申请日：2024-06-25
申请人： KURARAY CO., LTD.
发明人： Azusa OSHITA , Mitsuru KATO , Minori TAKEGOSHI , Chihiro OKAMOTO , Shinya KATO
IPC分类号： B24B37/24 , C08G18/69 , C08G18/83 , H01L21/306
CPC分类号： B24B37/24 , C08G18/692 , C08G18/83 , H01L21/30625
摘要： A modification method of a polyurethane, including the steps of: preparing a polyurethane having an ethylenically unsaturated bond; and treating the polyurethane with a liquid containing a compound having a conjugated double bond, or a modification method of a polyurethane, including the steps of: preparing a polyurethane having a conjugated double bond; and treating the polyurethane with a liquid containing a compound having an ethylenically unsaturated bond is used.
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公开(公告)号：US20190232460A1
公开(公告)日：2019-08-01
申请号：US16311518
申请日：2017-07-26
申请人： KURARAY CO., LTD.
发明人： Minori TAKEGOSHI , Mitsuru KATO , Chihiro OKAMOTO , Shinya KATO
IPC分类号： B24B37/24 , B24B37/04 , H01L21/3105 , H01L21/321
CPC分类号： B24B37/24 , B24B37/044 , H01L21/304 , H01L21/31053 , H01L21/3212
摘要： Provided is a polishing pad including a polishing surface having a zeta potential of +0.1 mV or more at a pH of 10.0. Preferably, a polishing pad including a polyurethane having a tertiary amine is provided. Further preferably, the polyurethane having a tertiary amine is a reaction product of a polyurethane reaction raw material containing at least a chain extender having a tertiary amine. A polishing method using the polishing pads is also provided, wherein the method is performed while supplying an alkaline polishing slurry.
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公开(公告)号：US20210276143A1
公开(公告)日：2021-09-09
申请号：US17054049
申请日：2019-04-26
申请人： KURARAY CO., LTD.
发明人： Azusa OSHITA , Mitsuru KATO , Minori TAKEGOSHI , Chihiro OKAMOTO , Shinya KATO
摘要： A modification method of a polyurethane, including the steps of: preparing a polyurethane having an ethylenically unsaturated bond; and treating the polyurethane with a liquid containing a compound having a conjugated double bond, or a modification method of a polyurethane, including the steps of: preparing a polyurethane having a conjugated double bond; and treating the polyurethane with a liquid containing a compound having an ethylenically unsaturated bond is used.
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公开(公告)号：US20170334034A1
公开(公告)日：2017-11-23
申请号：US15524339
申请日：2015-11-12
申请人： KURARAY CO., LTD.
CPC分类号： B24B37/24 , B24B37/26 , H01L21/304
摘要： Disclosed is a polishing-layer molded body including: a thermoplastic polyurethane that is a polymer of a monomer including: a polymer diol; an organic diisocyanate; a first chain extender including a diol having 4 or less carbon atoms; a second chain extender including a diol having 5 or more carbon atoms, a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate being 6.3 to 7.4 mass %, and the polishing-layer molded body being non-porous.
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公开(公告)号：US20170291275A1
公开(公告)日：2017-10-12
申请号：US15516607
申请日：2015-10-27
申请人： KURARAY CO., LTD
CPC分类号： B24B37/24 , B24B37/22 , B24D3/28 , C08G18/0895 , C08G18/3203 , C08G18/6607 , C08J2375/04 , H01L21/304
摘要： Disclosed is a non-porous molded article for a polishing layer, the non-porous molded article including a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum value of a loss tangent (tan 5) in a range of −70 to −50° C. of 4.00×10−2 or less. Preferably, the thermoplastic polyurethane is obtained by polymerization of a polymer diol having a number average molecular weight of 650 to 1400, an organic diisocyanate, and a chain extender, and a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate is 5.7 to 6.5 mass %.
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