Invention Application
- Patent Title: APPARATUS AND METHOD FOR TREATING SUBSTRATE, AND NOZZLE UNIT
-
Application No.: US17026504Application Date: 2020-09-21
-
Publication No.: US20210090911A1Publication Date: 2021-03-25
- Inventor: Yong Hoon HONG , Heehwan KIM , Ji Young LEE
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Priority: KR10-2019-0118363 20190925
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/687 ; B08B3/08 ; B08B13/00
Abstract:
The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate and a nozzle unit having a nozzle that dispenses a chemical onto the substrate, in which the nozzle is connected with a ground line, and a variable resistor is provided on the ground line.
Public/Granted literature
- US11424139B2 Apparatus and method for treating substrate, and nozzle unit Public/Granted day:2022-08-23
Information query
IPC分类:
