- 专利标题： ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
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申请号： US17371518申请日： 2021-07-09
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公开(公告)号： US20210335650A1公开(公告)日： 2021-10-28
- 发明人: Satoru Yamaki , Makoto Fukushima , Keisuke Namiki , Osamu Nabeya , Shingo Togashi , Tomoko Owada , Yoshikazu Kato
- 申请人： EBARA CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： EBARA CORPORATION
- 当前专利权人： EBARA CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2017-078933 20170412,JP2018-042410 20180308
- 主分类号： H01L21/687
- IPC分类号： H01L21/687 ; B24B37/30 ; B24B37/10 ; B24B7/04
摘要：
An elastic membrane to be used for a polishing head includes a contact portion configured to come into contact with a wafer, an annular side wall provided to stand on an outer peripheral end of the contact portion, a first partition wall linearly extending inward in a radial direction in sectional view from the side wall, and a second partition wall linearly extending inward and upward in the radial direction in sectional view from an outer peripheral end portion of the contact portion, wherein the first partition wall, the second partition wall, and the side wall constitute an edge pressure chamber for pressing an edge of the wafer.
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