• Patent Title: METHOD FOR REMOVING HALOGEN FLUORIDE, QUANTITATIVE ANALYSIS METHOD FOR GAS COMPONENT CONTAINED IN HALOGEN FLUORIDE MIXED GAS, AND QUANTITATIVE ANALYZER
  • Application No.: US17416807
    Application Date: 2019-12-09
  • Publication No.: US20220054972A1
    Publication Date: 2022-02-24
  • Inventor: Atsushi SUZUKIKazuma MATSUI
  • Applicant: SHOWA DENKO K.K.
  • Applicant Address: JP Tokyo
  • Assignee: SHOWA DENKO K.K.
  • Current Assignee: SHOWA DENKO K.K.
  • Current Assignee Address: JP Tokyo
  • Priority: JP2018-239516 20181221,JP2019-194301 20191025
  • International Application: PCT/JP2019/048055 WO 20191209
  • Main IPC: B01D53/14
  • IPC: B01D53/14 B01D53/30 B01D53/68
METHOD FOR REMOVING HALOGEN FLUORIDE, QUANTITATIVE ANALYSIS METHOD FOR GAS COMPONENT CONTAINED IN HALOGEN FLUORIDE MIXED GAS, AND QUANTITATIVE ANALYZER
Abstract:
A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.
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