Invention Application
- Patent Title: METHOD FOR REMOVING HALOGEN FLUORIDE, QUANTITATIVE ANALYSIS METHOD FOR GAS COMPONENT CONTAINED IN HALOGEN FLUORIDE MIXED GAS, AND QUANTITATIVE ANALYZER
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Application No.: US17416807Application Date: 2019-12-09
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Publication No.: US20220054972A1Publication Date: 2022-02-24
- Inventor: Atsushi SUZUKI , Kazuma MATSUI
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: JP Tokyo
- Priority: JP2018-239516 20181221,JP2019-194301 20191025
- International Application: PCT/JP2019/048055 WO 20191209
- Main IPC: B01D53/14
- IPC: B01D53/14 ; B01D53/30 ; B01D53/68

Abstract:
A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.
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