公开(公告)号：US20220054972A1

公开(公告)日：2022-02-24

申请号：US17416807

申请日：2019-12-09

Applicant: SHOWA DENKO K.K.

Inventor： Atsushi SUZUKI ,  Kazuma MATSUI

IPC: B01D53/14 ,  B01D53/30 ,  B01D53/68

Abstract: A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.

公开(公告)号：US20220223397A1

公开(公告)日：2022-07-14

申请号：US17608527

申请日：2020-11-12

Applicant: SHOWA DENKO K.K.

Inventor： Atsushi SUZUKI

IPC: H01J49/04 ,  H01J49/40 ,  H01J49/00

Abstract: A method for measuring the concentration of fluorine gas (F2) contained in a halogen fluoride-containing gas using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer, the method including, before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.

公开(公告)号：US20220214323A1

公开(公告)日：2022-07-07

申请号：US17609211

申请日：2020-11-12

Applicant: SHOWA DENKO K.K.

Inventor： Atsushi SUZUKI

IPC: G01N33/00 ,  G01N21/25 ,  G01N21/31 ,  G01N21/33

Abstract: A method for measuring the concentration of fluorine gas, which includes irradiating a halogen fluoride-containing gas with ultraviolet light in which the ratio (WX/WF) of the maximum value (WX) of ultraviolet light intensity in the wavelength region of less than 250 nm with respect to the ultraviolet light intensity (WF) at a wavelength of 285 nm is 1/10 or less, and measuring the absorbance at a wavelength of 285 nm to obtain the concentration of fluorine gas contained in the halogen fluoride-containing gas.

公开(公告)号：US20240003815A1

公开(公告)日：2024-01-04

申请号：US18037244

申请日：2021-11-08

Applicant: SHOWA DENKO K.K.

Inventor： Atsushi SUZUKI

IPC: G01N21/65 ,  G01N33/00

CPC classification number: G01N21/65 ,  G01N33/0027

Abstract: There is provided a gas analyzing method capable of analyzing impurities in a sample gas with high accuracy by reducing the influence of water present in a gas cell. The gas analyzing method is a method for analyzing the impurities contained in the sample gas, and includes: a pretreatment step of reducing the partial pressure of water in a gas cell (10) into which the sample gas is introduced to 10 Pa or less; and an analysis step of introducing the sample gas into the gas cell (10) in which the pretreatment step has been carried out and detecting the impurities by Raman spectroscopy.