Invention Application
- Patent Title: UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
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Application No.: US17007903Application Date: 2020-08-31
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Publication No.: US20220066321A1Publication Date: 2022-03-03
- Inventor: Joshua Kaitz , Sheng Liu , Li Cui , Shintaro Yamada , James F. Cameron , Emad Aqad , Iou-Sheng Ke , Suzanne M. Coley
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C08G8/04 ; C09D161/06

Abstract:
An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.
Information query
IPC分类: