公开(公告)号：US20240241440A1

公开(公告)日：2024-07-18

申请号：US18090145

申请日：2022-12-28

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Li Cui ,  Yinjie Cen ,  Wenxu Zhang ,  Mingqi Li ,  James F. Cameron

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/1808 ,  C08F220/1809 ,  G03F7/038

Abstract: A polymer, including a first repeating unit comprising a sulfone group, wherein the sulfone group is directly bonded to a group of formula —C(Ra)(Rb)—; and a second repeating unit comprising an acid labile group, a base-decomposable group, a polar group, or a combination thereof, wherein Ra and Rb are each independently hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C3-30 cycloalkenyl, substituted or unsubstituted C3-30 heterocycloalkenyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C2-30 heteroaryl, substituted or unsubstituted C3-30 heteroarylalkyl, or substituted or unsubstituted C3-30 alkylheteroaryl, provided that at least one of Ra and Rb is hydrogen.

公开(公告)号：US11932713B2

公开(公告)日：2024-03-19

申请号：US16236883

申请日：2018-12-31

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: G03F7/38 ,  C07F11/00 ,  C08F230/04 ,  C09D133/04 ,  C09D133/14 ,  C09D143/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: C08F230/04 ,  C07F11/00 ,  C09D133/04 ,  C09D133/14 ,  C09D143/00 ,  G03F7/0042 ,  G03F7/038 ,  G03F7/039 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/322 ,  G03F7/38

Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.

公开(公告)号：US20240027904A1

公开(公告)日：2024-01-25

申请号：US18352646

申请日：2023-07-14

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Tomas Marangoni ,  Yinjie Cen ,  Paul J. LaBeaume ,  Mingqi Li ,  James F. Cameron

IPC: G03F7/004 ,  C07D417/06 ,  C07D275/06

CPC classification number: G03F7/0045 ,  C07D417/06 ,  C07D275/06

Abstract: A photoactive compound including an organic cation; and an anion represented by Formula (1):




wherein X is an organic group; Y1 and Y2 are each independently a non-hydrogen substituent; Y1 and Y2 together optionally form a ring; Z2 is hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-50 aryl, substituted or unsubstituted C7-50 arylalkyl, substituted or unsubstituted C7-50 alkylaryl, substituted or unsubstituted C6-50 aryloxy, substituted or unsubstituted C3-30 heteroaryl, substituted or unsubstituted C4-30 alkylheteroaryl, substituted or unsubstituted C4-30 heteroarylalkyl, or substituted or unsubstituted C3-30 heteroaryloxy; Z2 optionally further comprises one or more divalent linking groups as part of its structure; Z2 and one of Y1 or Y2 together optionally form a ring; X and Z2 together optionally form a ring; and X and one of Y1 or Y2 together optionally form a ring.

公开(公告)号：US11733609B2

公开(公告)日：2023-08-22

申请号：US17370541

申请日：2021-07-08

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Charlotte A. Cutler ,  Li Cui ,  Shintaro Yamada ,  Paul J. LaBeaume ,  Suzanne M. Coley ,  James F. Cameron ,  Daniel Greene

IPC: G03F7/075 ,  G03F7/11 ,  G03F7/16 ,  G03F7/32 ,  G03F7/20 ,  G03F7/42 ,  C08F230/08 ,  C09D143/04 ,  C08F220/18

CPC classification number: G03F7/0752 ,  C08F230/08 ,  C08F230/085 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/20 ,  G03F7/322 ,  G03F7/423 ,  C08F220/1804 ,  C08F2800/10 ,  C09D143/04 ,  C08F220/1804 ,  C08F230/085

Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

公开(公告)号：US11042093B2

公开(公告)日：2021-06-22

申请号：US16167568

申请日：2018-10-23

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： James F. Cameron ,  Keren Zhang ,  Li Cui ,  Daniel Greene ,  Shintaro Yamada

IPC: G03F7/20 ,  C08G61/10 ,  G03F7/09

Abstract: A method of manufacturing a semiconductor device comprising: providing a semiconductor device substrate having a relief image on a surface of the substrate, the relief image having a plurality of gaps to be filled; applying a coating composition to the relief image to provide a coating layer, wherein the coating composition comprises (i) a polyarylene oligomer comprising as polymerized units one or more first monomers having two or more cyclopentadienone moieties and one or more second monomers having an aromatic moiety and two or more alkynyl moieties; wherein the polyarylene oligomer has a Mw of 1000 to 6000 Da, a PDI of 1 to 2, and a molar ratio of total first monomers to total second monomers of 1:>1; and (ii) one or more organic solvents; curing the coating layer to form a polyarylene film; patterning the polyarylene film; and transferring the pattern to the semiconductor device substrate.

公开(公告)号：US10894848B2

公开(公告)日：2021-01-19

申请号：US15790606

申请日：2017-10-23

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Charles R. Kinzie ,  Daniel Greene ,  Christopher Gilmore ,  James F. Cameron ,  Ping Ding ,  Qing Min Wang ,  Young-Seok Kim

IPC: C07C49/537 ,  C08F32/06 ,  C08L45/00 ,  C08G61/10 ,  C08G61/12 ,  C08L67/03 ,  H01L23/532 ,  C09D165/02 ,  C08L65/02

Abstract: Certain cyclopentadienone monomers having polar moieties are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers in electronics applications.

公开(公告)号：US10703917B2

公开(公告)日：2020-07-07

申请号：US15652192

申请日：2017-07-17

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： John P. Amara ,  James F. Cameron ,  Jin Wuk Sung ,  Gregory P. Prokopowicz

IPC: C09D5/00 ,  H01L21/027 ,  G03F7/16 ,  G03F7/20 ,  C08F220/36 ,  G03F7/09 ,  C07C69/76 ,  C07C69/94 ,  C09D133/14 ,  G03F7/32

Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

公开(公告)号：US20180253006A1

公开(公告)日：2018-09-06

申请号：US15971103

申请日：2018-05-04

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Li Cui ,  Charlotte A. Cutler ,  Suzanne M. Coley ,  Owendi Ongayi ,  Christopher P. Sullivan ,  Paul J. LaBeaume ,  Shintaro Yamada ,  Mingqi Li ,  James F. Cameron

IPC: G03F7/11 ,  G03F7/20 ,  C08F24/00 ,  C08F20/06 ,  C08F16/10 ,  C08F20/30 ,  C08F20/14 ,  C08G63/08 ,  C09D183/04 ,  C09D5/20 ,  C08G77/04 ,  G03F7/42 ,  G03F7/16 ,  G03F7/30

CPC classification number: G03F7/11 ,  C08F16/10 ,  C08F20/06 ,  C08F20/10 ,  C08F20/14 ,  C08F20/30 ,  C08F24/00 ,  C08F220/14 ,  C08F220/20 ,  C08F220/34 ,  C08F222/06 ,  C08F222/40 ,  C08F230/08 ,  C08F2220/1825 ,  C08F2220/1858 ,  C08F2220/1891 ,  C08F2220/282 ,  C08F2220/283 ,  C08F2220/325 ,  C08F2800/10 ,  C08G63/08 ,  C08G77/04 ,  C08G77/20 ,  C08G77/80 ,  C09D5/20 ,  C09D183/04 ,  G03F7/0752 ,  G03F7/161 ,  G03F7/20 ,  G03F7/30 ,  G03F7/422 ,  G03F7/423 ,  C08K5/19 ,  C08L33/14

Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

公开(公告)号：US10042251B2

公开(公告)日：2018-08-07

申请号：US15281683

申请日：2016-09-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  James F. Cameron

IPC: G03F7/004 ,  C07D333/76 ,  G03F7/32 ,  G03F7/38 ,  H01L21/027 ,  C07C381/12 ,  C07C309/12 ,  G03F7/039

Abstract: A photo-destroyable quencher having Formula (I): wherein in Formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US20170313889A1

公开(公告)日：2017-11-02

申请号：US15652192

申请日：2017-07-17

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： John P. Amara ,  James F. Cameron ,  Jin Wuk Sung ,  Gregory P. Prokopowicz

IPC: C09D5/00 ,  G03F7/32 ,  G03F7/20 ,  G03F7/16 ,  G03F7/09 ,  C09D133/14 ,  C08F220/36 ,  C07C69/94 ,  H01L21/027 ,  C07C69/76

CPC classification number: C09D5/006 ,  C07C69/76 ,  C07C69/94 ,  C08F220/36 ,  C09D133/14 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/322 ,  H01L21/0276

Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.