A memory transistor for a non-volatile memory cell includes a source region and a drain region implanted in a semiconductor substrate. The source region is spaced from the drain region. A double gate region for the memory transistor extends at least partly in depth in the semiconductor substrate between the source region and the drain region and further extends beyond this source region and this drain region. The memory cell further includes a selection transistor having a gate region that partially extends over the double gate region for the memory transistor.