- 专利标题： COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING BIS(AMINOSILYL)ALKYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON CONTAINING THIN FILM USING THE SAME
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申请号： US17572509申请日： 2022-01-10
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公开(公告)号： US20220139704A1公开(公告)日： 2022-05-05
- 发明人: Sung Gi KIM , Jeong Joo PARK , Joong Jin PARK , Se Jin JANG , Byeong-il YANG , Sang-Do LEE , Sam Dong LEE , Sang Ick LEE , Myong Woon KIM
- 申请人： DNF CO., LTD.
- 申请人地址： KR Daejeon
- 专利权人： DNF CO., LTD.
- 当前专利权人： DNF CO., LTD.
- 当前专利权人地址： KR Daejeon
- 优先权： KR10-2017-0040078 20170329,KR10-2017-0055632 20170428,KR10-2018-0035010 20180327
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; C23C16/32 ; C01B33/18 ; C01B21/068 ; C07F7/10 ; C23C16/455 ; C23C16/50 ; C23C16/40 ; C23C16/34 ; C23C16/30 ; C23C16/36 ; C09D1/00
摘要：
Provided are a composition for depositing a silicon-containing thin film containing a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing the bis(aminosilyl)alkylamine compound capable of being usefully used as a precursor of the silicon-containing thin film, and a method for manufacturing a silicon-containing thin film using the same.
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