Invention Application
- Patent Title: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
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Application No.: US17581177Application Date: 2022-01-21
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Publication No.: US20220146937A1Publication Date: 2022-05-12
- Inventor: Naoya Hatakeyama , Yasunori Yonekuta , Takamitsu Tomiga , Kohei Higashi , Fumihiro Yoshino
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2019-157420 20190829,JP2019-237512 20191226
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/004 ; G03F7/038 ; G03F7/38 ; G03F7/40

Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, (P) an amine oxide, and (D) an acid diffusion control agent (provided that acid diffusion control agents corresponding to the amine oxide are excluded), in which a content of the amine oxide (P) is from 0.01 ppm to 1,000 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, and a mass ratio of the acid diffusion control agent (D) to the amine oxide (P) is more than 1 and 10,000 or less.
Information query
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