公开(公告)号：US20230161253A1

公开(公告)日：2023-05-25

申请号：US18158781

申请日：2023-01-24

Applicant: FUJIFILM Corporation

Inventor： Fumihiro YOSHINO ,  Takamitsu Tomiga ,  Yuma Kurumisawa ,  Takumi Tanaka

IPC: G03F7/039 ,  G03F7/038 ,  C08F212/14 ,  C08F220/18

CPC classification number: G03F7/039 ,  G03F7/038 ,  C08F212/24 ,  C08F220/1804 ,  C08F220/1806

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) and a resin (B) which include a repeating unit having an acid-decomposable group, and the acid-decomposable group in the resin (A) and the acid-decomposable group in the resin (B) have the same structures. Regarding the resin (A) and the resin (B), |GA−GB| is from 5% by mole to 20% by mole, SA/SB is 10/90 to 90/10, |MwA−MwB| is from 100 to 5,000, and |MwA/MnA−MwB/MnB| is 0.05 or more.

公开(公告)号：US11009791B2

公开(公告)日：2021-05-18

申请号：US16015358

申请日：2018-06-22

Applicant: FUJIFILM Corporation

Inventor： Takamitsu Tomiga ,  Kenichi Harada ,  Shinichi Sugiyama ,  Fumihiro Yoshino ,  Shuji Hirano

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a glass transition temperature of 155° C. or higher, a compound (B) having a glass transition temperature of 150° C. or lower, and a solvent (C). A solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 20% by mass or more. A softening point of the resist pattern formed using the actinic ray-sensitive or radiation-sensitive resin composition is from 130° C. to 170° C.

公开(公告)号：US20220146937A1

公开(公告)日：2022-05-12

申请号：US17581177

申请日：2022-01-21

Applicant: FUJIFILM Corporation

Inventor： Naoya Hatakeyama ,  Yasunori Yonekuta ,  Takamitsu Tomiga ,  Kohei Higashi ,  Fumihiro Yoshino

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/004 ,  G03F7/038 ,  G03F7/38 ,  G03F7/40

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, (P) an amine oxide, and (D) an acid diffusion control agent (provided that acid diffusion control agents corresponding to the amine oxide are excluded), in which a content of the amine oxide (P) is from 0.01 ppm to 1,000 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, and a mass ratio of the acid diffusion control agent (D) to the amine oxide (P) is more than 1 and 10,000 or less.

公开(公告)号：US12061415B2

公开(公告)日：2024-08-13

申请号：US17902202

申请日：2022-09-02

Applicant: FUJIFILM Corporation

Inventor： Takumi Tanaka ,  Takashi Bannai ,  Takamitsu Tomiga ,  Kohei Higashi ,  Fumihiro Yoshino ,  Yuma Kurumisawa

IPC: G03F7/00 ,  G03F7/028

CPC classification number: G03F7/0035 ,  G03F7/028

Abstract: A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).

公开(公告)号：US20230028463A1

公开(公告)日：2023-01-26

申请号：US17902353

申请日：2022-09-02

Applicant: FUJIFILM Corporation

Inventor： Takamitsu Tomiga ,  Kohei Higashi ,  Fumihiro Yoshino ,  Yuma Kurumisawa ,  Takumi Tanaka

IPC: G03F7/004

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, comprising: preparing an intermediate solution which includes a photoacid generator and a solvent; and mixing the intermediate solution with at least a resin to prepare an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more.