Invention Application
- Patent Title: REDISTRIBUTION LAYER STRUCTURE
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Application No.: US17531777Application Date: 2021-11-21
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Publication No.: US20220189863A1Publication Date: 2022-06-16
- Inventor: Hung-Sheng Chou , Wen-Hsiang Liao , Kuo-Jung Fan , Heng-Shen Yeh , Cheng-Chi Wang
- Applicant: Innolux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: Innolux Corporation
- Current Assignee: Innolux Corporation
- Current Assignee Address: TW Miao-Li County
- Priority: CN202011481917.X 20201215,CN202111350591.1 20211115
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L21/48

Abstract:
A redistribution layer structure is provided. The redistribution layer structure includes a first metal layer, a first dielectric layer disposed on the first metal layer, a second metal layer disposed on the first dielectric layer, and a second dielectric layer disposed on the second metal layer. A coefficient of thermal expansion of the first dielectric layer is less than a coefficient of thermal expansion of the second dielectric layer.
Information query
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