Invention Application
- Patent Title: FLOW RATE CONTROL DEVICE
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Application No.: US17605948Application Date: 2020-04-16
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Publication No.: US20220197316A1Publication Date: 2022-06-23
- Inventor: Kaoru HIRATA , Keisuke IDEGUCHI , Shinya OGAWA , Katsuyuki SUGITA , Masaaki NAGASE , Kouji NISHINO , Nobukazu IKEDA , Hiroyuki ITO
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Priority: JP2019-083562 20190425
- International Application: PCT/JP2020/016674 WO 20200416
- Main IPC: G05D7/06
- IPC: G05D7/06 ; G01L13/06

Abstract:
The flow rate control device 10 includes a control valve 11, a restriction part 12 provided downstream of the control valve 11, an upstream pressure sensor 13 for measuring a pressure P1 between the control valve 11 and the restriction part 12, a differential pressure sensor 20 for measuring a differential pressure ΔP between the upstream and the downstream of the restriction part 12, and an arithmetic control circuit 16 connected to the control valve 11, the upstream pressure sensor 13, and the differential pressure sensor 20.
Public/Granted literature
- US11914407B2 Flow rate control device Public/Granted day:2024-02-27
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