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    DIAPHRAGM VALVE
    1.
    发明申请
    DIAPHRAGM VALVE 有权

    公开(公告)号：US20220268365A1

    公开(公告)日：2022-08-25

    申请号：US17638772

    申请日：2020-06-12

    Applicant: FUJIKIN INCORPORATED

    Inventor： Kaoru HIRATA ,  Masaaki NAGASE ,  Atsushi HIDAKA ,  Kazuyuki MORISAKI ,  Keisuke IDEGUCHI ,  Kosuke SUGIMOTO ,  Masafumi KITANO ,  Kouji NISHINO ,  Nobukazu IKEDA

    IPC: F16K7/17 ,  C09D127/12

    Abstract: A diaphragm valve includes a body 3 having a flow path 2 formed therein, a sheet 4 formed in the flow path 2, a metal diaphragm 5 for opening and closing the flow path 2 by abutting on or separating from the sheet 4, a pair of clamping parts 6 and 7 for claiming peripheral edge portions of both side surfaces of the metal diaphragm 5 respectively to fix the metal diaphragm 5 to the body 3, and an actuator 8 for abutting the metal diaphragm 5 on the sheet 4 or separating the metal diaphragm from the sheet 4, wherein a fluorine resin coating is formed on a sheet side surface 5a of the metal diaphragm 5 in a region excluding a clamping region D-C between the sheet side surface 5a and the clamping part 7, and at least in a contact region B-A with the sheet 4 in a region C surrounded by the clamping region D-C.

    PRESSURE CONTROL DEVICE
    2.
    发明申请
    PRESSURE CONTROL DEVICE 有权

    公开(公告)号：US20230011244A1

    公开(公告)日：2023-01-12

    申请号：US17785352

    申请日：2020-12-03

    Applicant: FUJIKIN INCORPORATED

    Inventor： Kaoru HIRATA ,  Kouji NISHINO ,  Katsuyuki SUGITA ,  Shinya OGAWA ,  Keisuke IDEGUCHI

    IPC: H01L21/3065 ,  G05D16/20 ,  H01L21/66

    Abstract: A pressure control device 20 includes a pressure control valve 25, a flow resistance 23 provided downstream of the pressure control valve, for restricting a gas flow, a first pressure sensor 21 for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor 22 for measuring a gas pressure downstream of the flow resistance, and an arithmetic control circuit 26 connected to the first pressure sensor and the second pressure sensor. The pressure control device is configured to control the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculate the flow rate of the gas downstream of the flow resistance based on the output of the first pressure sensor and the output of the second pressure sensor.

    FLOW RATE CONTROL DEVICE AND FLOW RATE CONTROL METHOD
    6.
    发明申请
    FLOW RATE CONTROL DEVICE AND FLOW RATE CONTROL METHOD 有权

    公开(公告)号：US20230129479A1

    公开(公告)日：2023-04-27

    申请号：US17760431

    申请日：2021-01-19

    Applicant: FUJIKIN INCORPORATED

    Inventor： Katsuyuki SUGITA ,  Kouji NISHINO ,  Kaoru HIRATA ,  Shinya OGAWA ,  Keisuke IDEGUCHI

    IPC: G05D7/06 ,  G05B19/414

    Abstract: A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal E1 output to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.

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