公开(公告)号：US20240160230A1

公开(公告)日：2024-05-16

申请号：US18418644

申请日：2024-01-22

Applicant: FUJIKIN INCORPORATED

Inventor： Kaoru HIRATA ,  Keisuke IDEGUCHI ,  Shinya OGAWA ,  Katsuyuki SUGITA ,  Masaaki NAGASE ,  Kouji NISHINO ,  Nobukazu IKEDA ,  Hiroyuki ITO

IPC: G05D7/06 ,  G01F1/36 ,  G01F15/00 ,  G01L13/06 ,  G01L19/08

CPC classification number: G05D7/0635 ,  G01F1/363 ,  G01F15/005 ,  G01L13/06 ,  G01L19/08 ,  Y10T137/7761

Abstract: The flow rate control device 10 includes a control valve 11, a restriction part 12 provided downstream of the control valve 11, an upstream pressure sensor 13 for measuring a pressure P1 between the control valve 11 and the restriction part 12, a differential pressure sensor 20 for measuring a differential pressure ΔP between the upstream and the downstream of the restriction part 12, and an arithmetic control circuit 16 connected to the control valve 11, the upstream pressure sensor 13, and the differential pressure sensor 20.

公开(公告)号：US20210157341A1

公开(公告)日：2021-05-27

申请号：US17047552

申请日：2019-04-19

Applicant: FUJIKIN INCORPORATED

Inventor： Kaoru HIRATA ,  Shinya OGAWA ,  Katsuyuki SUGITA ,  Kouji NISHINO ,  Nobukazu IKEDA

IPC: G05D7/06

Abstract: A flow rate control method performed using a flow rate control device 100 comprising a first control valve 6 provided in a flow path, a second control valve 8 provided downstream of the first control valve, and a pressure sensor 3 for measuring fluid pressure downstream of the first control valve, the method comprising steps of: (a) closing the opening of the first control valve from a state in which, while controlling the opening of the first control valve based on an output of the pressure sensor so as to be the first flow rate, maintaining the opening of the second control valve in an open state, and flowing a fluid at the first flow rate; and (b) based on the output of the pressure sensor, the pressure remaining downstream of the first control valve is controlled by adjusting the opening of the second control valve, and flowing the fluid at the second flow rate downstream of the second control valve.

公开(公告)号：US20200033895A1

公开(公告)日：2020-01-30

申请号：US16499174

申请日：2018-03-20

Applicant: FUJIKIN INCORPORATED

Inventor： Katsuyuki SUGITA ,  Kaoru HIRATA ,  Nobukazu IKEDA ,  Kouji NISHINO ,  Masahiko TAKIMOTO ,  Takahiro IMAI ,  Shinya OGAWA

IPC: G05D7/06 ,  G01F1/36

Abstract: A pressure-type flow rate control device includes a restriction part; a control valve provided upstream of the restriction part; an upstream pressure sensor for detecting pressure between the restriction part and the control valve; and an arithmetic processing circuit connected to the control valve and the upstream pressor sensor. The device is configured to perform flow rate control by controlling the control valve according to an output of the upstream pressure sensor. The arithmetic processing circuit performs an operation of closing the control valve in order to reduce a flow rate of a fluid flowing through the restriction part, and performs an operation of closing the control valve by feedback control in which a target value is an exponential function more gradual than the pressure drop characteristic data when a gas flows out of the restriction part.

公开(公告)号：US20230359228A1

公开(公告)日：2023-11-09

申请号：US18346434

申请日：2023-07-03

Applicant: FUJIKIN INCORPORATED

Inventor： Katsuyuki SUGITA ,  Kouji NISHINO ,  Naofumi YASUMOTO ,  Kaoru HIRATA ,  Shinya OGAWA ,  Keisuke IDEGUCHI

IPC: G05D7/06 ,  F16K31/00 ,  G05B15/02

CPC classification number: G05D7/0623 ,  F16K31/004 ,  G05B15/02 ,  G05D7/0635 ,  G01F1/363

Abstract: A flow rate control device 100 includes a control valve 6 provided in a flow path 1, a flow rate measurement unit 2, 3 for measuring fluid flow rate controlled by the control valve 6, and a controller 7. The controller 7 is configured so as to control the opening/closing operation of the control valve 6 to match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.

公开(公告)号：US20220197316A1

公开(公告)日：2022-06-23

申请号：US17605948

申请日：2020-04-16

Applicant: FUJIKIN INCORPORATED

Inventor： Kaoru HIRATA ,  Keisuke IDEGUCHI ,  Shinya OGAWA ,  Katsuyuki SUGITA ,  Masaaki NAGASE ,  Kouji NISHINO ,  Nobukazu IKEDA ,  Hiroyuki ITO

IPC: G05D7/06 ,  G01L13/06

Abstract: The flow rate control device 10 includes a control valve 11, a restriction part 12 provided downstream of the control valve 11, an upstream pressure sensor 13 for measuring a pressure P1 between the control valve 11 and the restriction part 12, a differential pressure sensor 20 for measuring a differential pressure ΔP between the upstream and the downstream of the restriction part 12, and an arithmetic control circuit 16 connected to the control valve 11, the upstream pressure sensor 13, and the differential pressure sensor 20.

公开(公告)号：US20210240208A1

公开(公告)日：2021-08-05

申请号：US16972157

申请日：2019-06-19

Applicant: FUJIKIN INCORPORATED

Inventor： Kaoru HIRATA ,  Shinya OGAWA ,  Katsuyuki SUGITA ,  Kouji NISHINO ,  Nobukazu IKEDA

IPC: G05D7/06 ,  G01F15/00 ,  G01F1/34

Abstract: A flow rate control method performed in a flow control device 100 having a first control valve 6 provided in the flow path, a second control valve 8 provided downstream of the first control valve, and a pressure sensor 3 for measuring a fluid pressure upstream of the first control valve and downstream of the second control valve, comprises, at the time of flow rate raise, a step (a) of determining a pressure remaining downstream of the first control valve by using a pressure sensor in a state of closing the second control valve, and a step (b) of controlling the pressure remaining downstream of the first control valve by adjusting the opening degree of the second control valve on the basis of the output from the pressure sensor, and flowing a fluid at the first flow rate downstream the second control valve.

公开(公告)号：US20230129479A1

公开(公告)日：2023-04-27

申请号：US17760431

申请日：2021-01-19

Applicant: FUJIKIN INCORPORATED

Inventor： Katsuyuki SUGITA ,  Kouji NISHINO ,  Kaoru HIRATA ,  Shinya OGAWA ,  Keisuke IDEGUCHI

IPC: G05D7/06 ,  G05B19/414

Abstract: A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal E1 output to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.

公开(公告)号：US20210141399A1

公开(公告)日：2021-05-13

申请号：US16970278

申请日：2019-02-15

Applicant: FUJIKIN INCORPORATED

Inventor： Katsuyuki SUGITA ,  Kouji NISHINO ,  Naofumi YASUMOTO ,  Kaoru HIRATA ,  Shinya OGAWA ,  Keisuke IDEGUCHI

IPC: G05D7/06 ,  F16K31/00 ,  G05B15/02

Abstract: A flow rate control device 100 includes a control valve 6 provided in a flow path 1, a flow rate measurement unit 2, 3 for measuring fluid flow rate controlled by the control valve 6, and a controller 7. The controller 7 is configured so as to control the opening/closing operation of the control valve 6 to match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.

公开(公告)号：US20230011244A1

公开(公告)日：2023-01-12

申请号：US17785352

申请日：2020-12-03

Applicant: FUJIKIN INCORPORATED

Inventor： Kaoru HIRATA ,  Kouji NISHINO ,  Katsuyuki SUGITA ,  Shinya OGAWA ,  Keisuke IDEGUCHI

IPC: H01L21/3065 ,  G05D16/20 ,  H01L21/66

Abstract: A pressure control device 20 includes a pressure control valve 25, a flow resistance 23 provided downstream of the pressure control valve, for restricting a gas flow, a first pressure sensor 21 for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor 22 for measuring a gas pressure downstream of the flow resistance, and an arithmetic control circuit 26 connected to the first pressure sensor and the second pressure sensor. The pressure control device is configured to control the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculate the flow rate of the gas downstream of the flow resistance based on the output of the first pressure sensor and the output of the second pressure sensor.

公开(公告)号：US20190243391A1

公开(公告)日：2019-08-08

申请号：US16340155

申请日：2017-10-12

Applicant: FUJIKIN INCORPORATED

Inventor： Kaoru HIRATA ,  Katsuyuki SUGITA ,  Takahiro IMAI ,  Shinya OGAWA ,  Kouji NISHINO ,  Nobukazu IKEDA

IPC: G05D7/06 ,  H01L21/67

CPC classification number: G05D7/0635 ,  G05D7/06 ,  H01L21/67017

Abstract: A fluid control device includes a main body block including a first flow passage, and a second flow passage, a first and second fluid control units installed on an installation surface of the main body block. The first and second flow passages include a first portion extending along a first direction and a second flow passage portion orthogonal to the first direction. The second portion is formed of a hole extending from a side surface of the main body block and a sealing member.