Invention Application
- Patent Title: POLYMER AND RESIN COMPOSITION THEREOF
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Application No.: US17139088Application Date: 2020-12-31
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Publication No.: US20220204697A1Publication Date: 2022-06-30
- Inventor: Jyh-Long JENG , Jeng-Yu TSAI , Wei-Ta YANG
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Main IPC: C08G73/10
- IPC: C08G73/10 ; G03F7/038 ; G03F7/028

Abstract:
A polymer and a resin composition thereof are provided. The polymer includes a first repeat unit represented by Formula (I) and a second repeat unit represented by Formula (II) wherein A1 is C24-48 alkylene, C24-48 alkenylene, C24-48 alkynylene, C24-48 alicyclic alkylene, C24-48 alicyclic alkenylene, or C24-48 alicyclic alkynylene. A2 and A4, independently having at least one reactive group, are independently C6-25 arylene, C4-8 cycloalkylene, C5-25 heteroarylene, divalent C7-25 alkylaryl, divalent C7-25 acylaryl, divalent C6-25 aryl ether, divalent C7-25 acyloxyaryl, or divalent C6-25 sulfonylaryl; and, A3 is substituted or unsubstituted C6-25 arylene, C4-8 cycloalkylene, C5-25 heteroarylene, divalent C7-25 alkylaryl, divalent C7-25 acylaryl, divalent C6-25 aryl ether, divalent C7-25 acyloxyaryl, or divalent C6-25 sulfonylaryl.
Information query