Invention Application
- Patent Title: TRANSPARENT GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
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Application No.: US17613478Application Date: 2020-05-26
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Publication No.: US20220220602A1Publication Date: 2022-07-14
- Inventor: Kiyoshi ISEKI , Daisuke IWATA
- Applicant: TOYOBO CO., LTD.
- Applicant Address: JP Osaka
- Assignee: TOYOBO CO., LTD.
- Current Assignee: TOYOBO CO., LTD.
- Current Assignee Address: JP Osaka
- Priority: JP2019-102710 20190531,JP2019-102711 20190531
- International Application: PCT/JP2020/020687 WO 20200526
- Main IPC: C23C14/08
- IPC: C23C14/08 ; C23C14/30 ; C23C14/58

Abstract:
An object of the present invention is to provide a transparent barrier film that has excellent acid resistance and is inexpensive, and a method for producing the same. A transparent gas barrier film includes a plastic film and an aluminum oxide layer provided on at least one surface of the plastic film, the aluminum oxide layer mainly composed of aluminum oxide. The absorption coefficient of the inorganic oxide layer immediately after vapor-deposition is less than 0.03 nm−1, and the film thickness of the inorganic oxide layer is 6 nm or more and 10 nm or less.
Information query
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