Invention Application
- Patent Title: COMPOSITION FOR TREATING ATOPY OR PRURITUS COMPRISING N-ACETYL OR N-ACYL AMINO ACID
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Application No.: US17668678Application Date: 2022-02-10
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Publication No.: US20220233485A1Publication Date: 2022-07-28
- Inventor: Myung-Kwan HAN , Kwangho LEE
- Applicant: STEMDR INC. , INDUSTRIAL COOPERATION FOUNDATION CHONBUK NATIONAL UNIVERSITY , KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
- Applicant Address: KR Jeollabuk-do; KR Jeollabuk-do; KR Daejeon
- Assignee: STEMDR INC.,INDUSTRIAL COOPERATION FOUNDATION CHONBUK NATIONAL UNIVERSITY,KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
- Current Assignee: STEMDR INC.,INDUSTRIAL COOPERATION FOUNDATION CHONBUK NATIONAL UNIVERSITY,KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
- Current Assignee Address: KR Jeollabuk-do; KR Jeollabuk-do; KR Daejeon
- Priority: KR10-2017-0158599 20171124,KR10-2018-0145159 20181122
- Main IPC: A61K31/198
- IPC: A61K31/198 ; A23L33/175 ; A23L33/00 ; A61P17/04 ; A61K8/02 ; A61K8/44 ; A61K8/49 ; A61K31/405 ; A61Q19/00
Abstract:
The present disclosure relates to a composition for preventing, alleviating or treating pruritus and/or atopy using an N-acetylamino acid or an N-acylamino acid having almost no side effects on the human body. Also, the present disclosure relates to a cosmetic composition for moisturizing skin or soothing skin. The composition of the present disclosure may be utilized to ameliorate a problematic skin condition caused by various causes, or to safely and effectively alleviate or treat pruritus and/or atopy without concern about side effects.
Information query
IPC分类:
