Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
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Application No.: US17412022Application Date: 2021-08-25
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Publication No.: US20220285284A1Publication Date: 2022-09-08
- Inventor: Yoichi MIZUTA , Takahiro TSURUDO , Yoshiaki TAKAHASHI , Kenichi MATOBA , Yoshifumi SHIMAMURA , Toru OZAWA , Takumi KOSAKI , Kouji NAKAO
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2021-032632 20210302
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/768 ; H01L21/66
Abstract:
According to one embodiment, a semiconductor device includes a circuit pattern including a plurality of unit patterns that are disposed in a repeating manner in at least one direction. The semiconductor device includes a discrimination pattern provided in the circuit pattern and configured to discriminate the unit patterns from each other.
Public/Granted literature
- US12218072B2 Semiconductor device and method for manufacturing the same Public/Granted day:2025-02-04
Information query
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