Invention Application
- Patent Title: Memory Array Including Epitaxial Source Lines and Bit Lines
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Application No.: US17884348Application Date: 2022-08-09
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Publication No.: US20220384484A1Publication Date: 2022-12-01
- Inventor: Bo-Feng Young , Sai-Hooi Yeong , Chih-Yu Chang , Chi On Chui , Yu-Ming Lin
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L27/11597
- IPC: H01L27/11597 ; H01L29/06 ; H01L27/11587

Abstract:
A 3D memory array in which epitaxial source/drain regions which are horizontally merged and vertically unmerged are used as source lines and bit lines and methods of forming the same are disclosed. In an embodiment, a memory array includes a first channel region over a semiconductor substrate; a first epitaxial region electrically coupled to the first channel region; a second epitaxial region directly over the first epitaxial region in a direction perpendicular to a major surface of the semiconductor substrate; a dielectric material between the first epitaxial region and the second epitaxial region, the second epitaxial region being isolated from the first epitaxial region by the dielectric material; a gate dielectric surrounding the first channel region; and a gate electrode surrounding the gate dielectric.
Information query
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