Invention Publication
- Patent Title: ADVANCED STRUCTURES HAVING MOSFET TRANSISTORS AND METAL LAYERS
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Application No.: US18055397Application Date: 2022-11-14
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Publication No.: US20230154847A1Publication Date: 2023-05-18
- Inventor: Fu-Chang Hsu
- Applicant: Fu-Chang Hsu
- Applicant Address: US CA San Jose
- Assignee: Fu-Chang Hsu
- Current Assignee: Fu-Chang Hsu
- Current Assignee Address: US CA San Jose
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L27/092 ; H01L29/06 ; H01L29/423 ; H01L29/775 ; H01L21/683 ; H01L21/822 ; H01L21/8238 ; H01L29/66

Abstract:
Advanced structures having MOSFET transistors and metal layers are disclosed. In one embodiment, a transistor structure is provided that includes a first transistor layer, a second transistor layer located under the first transistor layer, a first power bus layer located above the first transistor layer, a second power bus layer located under the second transistor layer, and a first interconnect layer located above the first power bus layer.
Information query
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