- 专利标题: ADVANCED STRUCTURES HAVING MOSFET TRANSISTORS AND METAL LAYERS
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申请号: US18055397申请日: 2022-11-14
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公开(公告)号: US20230154847A1公开(公告)日: 2023-05-18
- 发明人: Fu-Chang Hsu
- 申请人: Fu-Chang Hsu
- 申请人地址: US CA San Jose
- 专利权人: Fu-Chang Hsu
- 当前专利权人: Fu-Chang Hsu
- 当前专利权人地址: US CA San Jose
- 主分类号: H01L23/528
- IPC分类号: H01L23/528 ; H01L27/092 ; H01L29/06 ; H01L29/423 ; H01L29/775 ; H01L21/683 ; H01L21/822 ; H01L21/8238 ; H01L29/66
摘要:
Advanced structures having MOSFET transistors and metal layers are disclosed. In one embodiment, a transistor structure is provided that includes a first transistor layer, a second transistor layer located under the first transistor layer, a first power bus layer located above the first transistor layer, a second power bus layer located under the second transistor layer, and a first interconnect layer located above the first power bus layer.
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