- 专利标题: DEPOSITION METHODS AND APPARATUS FOR PIEZOELECTRIC APPLICATIONS
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申请号: US18022652申请日: 2020-08-24
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公开(公告)号: US20230320223A1公开(公告)日: 2023-10-05
- 发明人: Abhijeet Laxman SANGLE , Vijay Bhan SHARMA , Yuan XUE , Ankur KADAM , Bharatwaj RAMAKRISHNAN , Uday PAI , Nilesh PATIL
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 国际申请: PCT/CN2020/110838 2020.08.24
- 进入国家日期: 2023-02-22
- 主分类号: H10N30/50
- IPC分类号: H10N30/50 ; H10N30/093 ; H10N30/00 ; H10N30/853 ; H10N30/87
摘要:
Disclosed are methods and apparatus for depositing uniform layers on a substrate (201) for piezoelectric applications. An ultra-thin seed layer (308) having a uniform thickness from center to edge thereof is deposited on a substrate (201). A template layer (310) closely matching the crystal structure of a subsequently formed piezoelectric material layer (312) is deposited on a substrate (201). The uniform thickness and orientation of the seed layer (308) and the template layer (310), in turn, facilitate the growth of piezoelectric materials with improved crystallinity and piezoelectric properties.
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