Invention Publication
- Patent Title: DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
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Application No.: US18493614Application Date: 2023-10-23
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Publication No.: US20240136153A1Publication Date: 2024-04-25
- Inventor: Matthew Scott Weimer , Pramod Subramonium , Ragesh Puthenkovilakam , Rujun Bai , David French
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/517 ; C23C16/52 ; H01L21/027 ; H01L21/311 ; H01L21/3213
Abstract:
Methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate include pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.
Public/Granted literature
- US20240234091A9 DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF Public/Granted day:2024-07-11
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