- 专利标题: PHOTOCATALYST DECOMPOSITION SYSTEM
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申请号: US18485656申请日: 2023-10-12
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公开(公告)号: US20240139723A1公开(公告)日: 2024-05-02
- 发明人: Hiromasa TAKAHASHI , Shin YABUUCHI , Naoto FUKATANI , Daiko TAKAMATSU
- 申请人: Hitachi, Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP 22175972 2022.11.02
- 主分类号: B01J35/00
- IPC分类号: B01J35/00 ; B01J7/00 ; B01J21/02 ; B01J21/06 ; B01J23/02 ; B01J23/10 ; B01J23/20 ; B01J23/22 ; B01J23/30 ; B01J23/42 ; B01J23/46 ; B01J23/50 ; B01J23/58 ; B01J23/60 ; B01J23/648 ; B01J23/68 ; B01J23/75 ; B01J23/755 ; B01J27/04 ; B01J27/14 ; B01J27/198 ; B01J27/24 ; C01B3/04 ; C01B13/02
摘要:
To provide a photocatalyst decomposition apparatus that can supply a liquid phase containing a substance to be decomposed by a photocatalyst and that can perform decomposition of the substance more efficiently than in the related art. A photocatalyst decomposition system according to the invention includes: a gas phase generation apparatus configured to convert a liquid phase containing a decomposition object into a gas phase; and a photocatalyst member configured to come into contact with the gas phase to decompose the decomposition object by light from a light source. The photocatalyst member includes a base material formed of a porous material and a photocatalyst layer provided on a surface of the base material.
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