Invention Publication
- Patent Title: IC STRUCTURE WITH GATE ELECTRODE FULLY WITHIN V-SHAPED CAVITY
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Application No.: US18059186Application Date: 2022-11-28
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Publication No.: US20240178290A1Publication Date: 2024-05-30
- Inventor: Megan Lydon-Nuhfer , Steven M. Shank , Aaron L. Vallett , Michel Abou-Khalil , Sarah A. McTaggart , Rajendran Krishnasamy
- Applicant: GlobalFoundries U.S. Inc.
- Applicant Address: US NY Malta
- Assignee: GlobalFoundries U.S. Inc.
- Current Assignee: GlobalFoundries U.S. Inc.
- Current Assignee Address: US NY Malta
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/06 ; H01L29/08 ; H01L29/40 ; H01L29/49 ; H01L29/66

Abstract:
An integrated circuit (IC) structure includes a V-shaped cavity in a semiconductor substrate. A source region and a drain region are on opposing sides of the V-shaped cavity. A gate structure includes a gate dielectric layer, spacers, and a gate electrode on the gate dielectric layer between the spacers. The gate structure is fully within the V-shaped cavity. The IC structure provides a switch that finds advantageous application as part of a low noise amplifier. The IC structure provides a smaller gate width, decreased capacitance, increased gain and increased radio frequency (RF) performance compared to planar devices or devices without the gate structure fully within V-shaped cavity.
Information query
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